The adsorption, thermal desorption and photochemistry of methyl iodide on an Ag-covered TiO2(110) surface

Chaochin Su; Chih Chieng Chen; Chih Song Tsai; Jong Liang Lin; Jiing Chyuan Lin

doi:10.1002/jccs.200600106

The adsorption, thermal desorption and photochemistry of methyl iodide on an Ag-covered TiO₂(110) surface

Chaochin Su, Chih Chieng Chen, Chih Song Tsai, Jong Liang Lin, Jiing Chyuan Lin

Department of Chemistry

Research output: Contribution to journal › Article

2 Citations (Scopus)

Abstract

The thermal reactions and photochemistry of monolayer methyl iodide (CH₃I) on a silver covered TiO₂(110) surface have been studied using combinative techniques of temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS). About ∼60% of CH₃I at monolayer coverage on Ag/TiO₂(110) dissociates between 130 and 200 K yield adsorbed CH₃ and I, with the rest desorbing molecularly at a peak temperature of 200 K in a TPD study. Photochemistry of CH₃I on Ag/TiO₂(110) is wavelength dependent. Irradiation of monolayer CH₃I by 404 nm photon causes C-I bond dissociation and CH₃ desorption. Upon 290 nm, UV irradiation, the depletion of CH₃I _(a) is dominated by photodesorption of molecular CH₃I.

Original language	English
Pages (from-to)	803-813
Number of pages	11
Journal	Journal of the Chinese Chemical Society
Volume	53
Issue number	4
DOIs	https://doi.org/10.1002/jccs.200600106
Publication status	Published - 2006 Aug

All Science Journal Classification (ASJC) codes

Chemistry(all)

Access to Document

10.1002/jccs.200600106

Fingerprint Dive into the research topics of 'The adsorption, thermal desorption and photochemistry of methyl iodide on an Ag-covered TiO<sub>2</sub>(110) surface'. Together they form a unique fingerprint.

Cite this

Su, C., Chen, C. C., Tsai, C. S., Lin, J. L., & Lin, J. C. (2006). The adsorption, thermal desorption and photochemistry of methyl iodide on an Ag-covered TiO₂(110) surface. Journal of the Chinese Chemical Society, 53(4), 803-813. https://doi.org/10.1002/jccs.200600106

@article{164011f1f5f14f1daf8a443754f5e3af,

title = "The adsorption, thermal desorption and photochemistry of methyl iodide on an Ag-covered TiO2(110) surface",

abstract = "The thermal reactions and photochemistry of monolayer methyl iodide (CH3I) on a silver covered TiO2(110) surface have been studied using combinative techniques of temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS). About ∼60% of CH3I at monolayer coverage on Ag/TiO2(110) dissociates between 130 and 200 K yield adsorbed CH3 and I, with the rest desorbing molecularly at a peak temperature of 200 K in a TPD study. Photochemistry of CH3I on Ag/TiO2(110) is wavelength dependent. Irradiation of monolayer CH3I by 404 nm photon causes C-I bond dissociation and CH3 desorption. Upon 290 nm, UV irradiation, the depletion of CH3I (a) is dominated by photodesorption of molecular CH3I.",

author = "Chaochin Su and Chen, {Chih Chieng} and Tsai, {Chih Song} and Lin, {Jong Liang} and Lin, {Jiing Chyuan}",

year = "2006",

month = aug,

doi = "10.1002/jccs.200600106",

language = "English",

volume = "53",

pages = "803--813",

journal = "Journal of the Chinese Chemical Society",

issn = "0009-4536",

publisher = "Chinese Chemical Society",

number = "4",

}

TY - JOUR

T1 - The adsorption, thermal desorption and photochemistry of methyl iodide on an Ag-covered TiO2(110) surface

AU - Su, Chaochin

AU - Chen, Chih Chieng

AU - Tsai, Chih Song

AU - Lin, Jong Liang

AU - Lin, Jiing Chyuan

PY - 2006/8

Y1 - 2006/8

N2 - The thermal reactions and photochemistry of monolayer methyl iodide (CH3I) on a silver covered TiO2(110) surface have been studied using combinative techniques of temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS). About ∼60% of CH3I at monolayer coverage on Ag/TiO2(110) dissociates between 130 and 200 K yield adsorbed CH3 and I, with the rest desorbing molecularly at a peak temperature of 200 K in a TPD study. Photochemistry of CH3I on Ag/TiO2(110) is wavelength dependent. Irradiation of monolayer CH3I by 404 nm photon causes C-I bond dissociation and CH3 desorption. Upon 290 nm, UV irradiation, the depletion of CH3I (a) is dominated by photodesorption of molecular CH3I.

AB - The thermal reactions and photochemistry of monolayer methyl iodide (CH3I) on a silver covered TiO2(110) surface have been studied using combinative techniques of temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS). About ∼60% of CH3I at monolayer coverage on Ag/TiO2(110) dissociates between 130 and 200 K yield adsorbed CH3 and I, with the rest desorbing molecularly at a peak temperature of 200 K in a TPD study. Photochemistry of CH3I on Ag/TiO2(110) is wavelength dependent. Irradiation of monolayer CH3I by 404 nm photon causes C-I bond dissociation and CH3 desorption. Upon 290 nm, UV irradiation, the depletion of CH3I (a) is dominated by photodesorption of molecular CH3I.

UR - http://www.scopus.com/inward/record.url?scp=34047143708&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34047143708&partnerID=8YFLogxK

U2 - 10.1002/jccs.200600106

DO - 10.1002/jccs.200600106

M3 - Article

AN - SCOPUS:34047143708

VL - 53

SP - 803

EP - 813

JO - Journal of the Chinese Chemical Society

JF - Journal of the Chinese Chemical Society

SN - 0009-4536

IS - 4

ER -