The adsorption, thermal desorption and photochemistry of methyl iodide on an Ag-covered TiO2(110) surface

Chaochin Su, Chih Chieng Chen, Chih Song Tsai, Jong Liang Lin, Jiing Chyuan Lin

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2 Citations (Scopus)

Abstract

The thermal reactions and photochemistry of monolayer methyl iodide (CH3I) on a silver covered TiO2(110) surface have been studied using combinative techniques of temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS). About ∼60% of CH3I at monolayer coverage on Ag/TiO2(110) dissociates between 130 and 200 K yield adsorbed CH3 and I, with the rest desorbing molecularly at a peak temperature of 200 K in a TPD study. Photochemistry of CH3I on Ag/TiO2(110) is wavelength dependent. Irradiation of monolayer CH3I by 404 nm photon causes C-I bond dissociation and CH3 desorption. Upon 290 nm, UV irradiation, the depletion of CH3I (a) is dominated by photodesorption of molecular CH3I.

Original languageEnglish
Pages (from-to)803-813
Number of pages11
JournalJournal of the Chinese Chemical Society
Volume53
Issue number4
DOIs
Publication statusPublished - 2006 Aug

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

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