The effect of electromagnetic retardation on the rupture process of a very thin liquid film

Chi Chuan Hwang; Te Chih Ke; Chaur Kie Lin; Chih Woei Shiau

doi:10.1006/jcis.1999.6493

The effect of electromagnetic retardation on the rupture process of a very thin liquid film

Chi Chuan Hwang, Te Chih Ke, Chaur Kie Lin, Chih Woei Shiau

Department of Engineering Science

Research output: Contribution to journal › Article › peer-review

Abstract

Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a fiat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T(LM) is larger than the nonlinear rupture time T(NM), but the gradient of T(LM) to D is comparable to that of T(NM).

Original language	English
Pages (from-to)	357-359
Number of pages	3
Journal	Journal of Colloid And Interface Science
Volume	219
Issue number	2
DOIs	https://doi.org/10.1006/jcis.1999.6493
Publication status	Published - 1999 Nov 15

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Biomaterials
Surfaces, Coatings and Films
Colloid and Surface Chemistry

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10.1006/jcis.1999.6493

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title = "The effect of electromagnetic retardation on the rupture process of a very thin liquid film",

abstract = "Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a fiat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T(LM) is larger than the nonlinear rupture time T(NM), but the gradient of T(LM) to D is comparable to that of T(NM).",

author = "Hwang, {Chi Chuan} and Ke, {Te Chih} and Lin, {Chaur Kie} and Shiau, {Chih Woei}",

note = "Funding Information: The authors acknowledge with appreciation the financial support (Grant NSC 88-2212-E033-005) provided by the National Science Council of the Republic of China.",

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AU - Hwang, Chi Chuan

AU - Ke, Te Chih

AU - Lin, Chaur Kie

AU - Shiau, Chih Woei

N1 - Funding Information: The authors acknowledge with appreciation the financial support (Grant NSC 88-2212-E033-005) provided by the National Science Council of the Republic of China.

PY - 1999/11/15

Y1 - 1999/11/15

N2 - Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a fiat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T(LM) is larger than the nonlinear rupture time T(NM), but the gradient of T(LM) to D is comparable to that of T(NM).

AB - Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a fiat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T(LM) is larger than the nonlinear rupture time T(NM), but the gradient of T(LM) to D is comparable to that of T(NM).

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The effect of electromagnetic retardation on the rupture process of a very thin liquid film

Abstract

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