The effect of electromagnetic retardation on the rupture process of a very thin liquid film

Chi Chuan Hwang, Te Chih Ke, Chaur Kie Lin, Chih Woei Shiau

Research output: Contribution to journalArticlepeer-review

Abstract

Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a fiat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T(LM) is larger than the nonlinear rupture time T(NM), but the gradient of T(LM) to D is comparable to that of T(NM).

Original languageEnglish
Pages (from-to)357-359
Number of pages3
JournalJournal of Colloid And Interface Science
Volume219
Issue number2
DOIs
Publication statusPublished - 1999 Nov 15

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Surfaces, Coatings and Films
  • Colloid and Surface Chemistry

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