The effects of nitrogen flow on reactively sputtered TiAlN films

Bor Yuan Shew, Jow Lay Huang

Research output: Contribution to journalArticlepeer-review

63 Citations (Scopus)


A thin coating of TiAlN was deposited on a high speed steel cutting tool material by a reactive sputtering process. The effects of N2 flow rate on the microstructure, chemical composition and mechanical properties of such TiAlN films were investigated. A stoichiometric composition of TiAlN was obtained at a certain critical nitrogen flow rate (fcN2). A further increase in N2 flow led to no detectable changes in chemical composition. A dense, isotropic, fine-grained microstructure was obtained; the optimized hardness, toughness and wear resistance occurred at an N2 flow rate greater than fcN2. This was probably due to the different kinetics of nitridation of Ti and Al.

Original languageEnglish
Pages (from-to)30-36
Number of pages7
JournalSurface and Coatings Technology
Issue number1
Publication statusPublished - 1995 Feb

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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