The effects of TiAl interlayer on PVD TiAlN films

Ding Fwu Lii, Jow Lay Huang, Ming Hung Lin

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)


TiAlN films with a TiAl interlayer were deposited on high-speed steel through a reactive sputtering process. A semi-coherent interface was observed between TiAl and TiAlN. Owing to the diffusion of nitrogen, a good bonding had formed between these layers. The TiAl interlayer substantially increased the adhesive strength of TiAlN films and, therefore, significantly affected the wear behavior. In addition, TiAlN films with a 1 μn TiAl interlayer exhibited the highest wear resistance.

Original languageEnglish
Pages (from-to)197-202
Number of pages6
JournalSurface and Coatings Technology
Issue number1-2
Publication statusPublished - 1998 Feb 5

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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