The growth mechanism of GaN grown by hydride vapor phase epitaxy in N 2 and H2 carrier gas

Hai Ping Liu, Jenq Dar Tsay, Wen Yueh Liu, Yih Der Guo, Jung Tsung Hsu, In Gann Chen

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

This paper investigates the growth mechanism of GaN for the hydride vapor phase epitaxy (HVPE) process in the N2 and H2 carrier gas ambients. Differences are observed between the surface morphologies of GaN films grown in N2 carrier gas and those grown in H2 carrier gas. It is determined that the GaN growth direction and growth rate are both affected by H2 flow rate. In N2 ambient, the {1 1̄ 0 1} facet is stable, because of the N-polarity and high dangling bond density (DB) of {1 1̄ 0 1} facet. On the other hand, in H2 ambient, and the {1 1̄ 0 0} facet becomes stable. In this paper, this phenomenon will be explained by the atomic configuration model of the GaN wurtzite structure.

Original languageEnglish
Pages (from-to)79-84
Number of pages6
JournalJournal of Crystal Growth
Volume260
Issue number1-2
DOIs
Publication statusPublished - 2004 Jan 2

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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