The influence of methane/argon plasma composition on the formation of the hydrogenated amorphous carbon films

Hsin Hung Chen, Jiunn Der Liao, Chih Chiang Weng, Jui Fu Hsieh, Chia Wei Chang, Chao Hsien Lin, Ting Pin Cho

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The quality of the a-C:H films was particularly correlated with the mixed ratio of methane/argon plasma. For a constant supply of energy and flowing rate, the optical emission from Hα intensity linearly increased with the addition of methane in argon plasma, while that from intensities of radiation of diatmoic radicals (CH*and C2 *) exponentially decreased. For the a-C:H films, the added methane in argon plasma tended to raise the quantity of hydrogenated carbon or sp3 C-H structure, which exponentially decreased the nano-hardness and friction coefficient of the films. In contrast, the electric resistance of the films enlarged dramatically with the increase of the methane content in argon plasma. It is therefore advantageous to balance the mechanical properties and electrical resistance of the a-C:H film by adjusting plasma composition in the course of the film-growing process.

Original languageEnglish
Pages (from-to)2049-2053
Number of pages5
JournalThin Solid Films
Volume519
Issue number6
DOIs
Publication statusPublished - 2011 Jan 3

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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