The microstructure of Co nanoparticles directly deposited on Si (001) substrates using DC magnetron sputtering

Bing Xian Chung, Chuan-Pu Liu, Jiun Nan Chen

Research output: Contribution to journalConference article

Abstract

Dispersive cobalt nanoparticles are fabricated directly on Si (001) substrates by DC magnetron sputtering at room temperature. During deposition, the parameters chosen for the investigation are substrate bias (from +525 To -100 Volts), target-to-substrate distance (from 6 to 12 cm) and deposition time (from 10 to 30m sec), while the other parameters are kept the same, including the power of 50 watts. Atomic force microscope (AFM) is employed to determine the density and morphology of cobalt nanoparticles whereas high-resolution electron microscope (HRTEM) is used to visualize the resulting microstrucrure in the nanoparticles. It is found that Co nanoparticle array can be formed by combining the optimum substrate bias and target-to-substrate distance. The size uniformity of the nanoparticle array can be enhanced by positive bias due to charging effects. The nanoparticle of as small as a few nanometers can be successfully fabricated by DC-sputtering and can be applied to nanotube growth as catalysts.

Original languageEnglish
Pages (from-to)727-731
Number of pages5
JournalMaterials Research Society Symposium - Proceedings
Volume737
Publication statusPublished - 2003 Jul 25
EventQuantum Confined Semiconductor Nanostructures - Boston MA, United States
Duration: 2002 Dec 22002 Dec 5

Fingerprint

Magnetron sputtering
magnetron sputtering
direct current
Nanoparticles
nanoparticles
microstructure
Microstructure
Substrates
Cobalt
cobalt
Nanotubes
Sputtering
charging
nanotubes
Microscopes
Electron microscopes
electron microscopes
sputtering
microscopes
catalysts

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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title = "The microstructure of Co nanoparticles directly deposited on Si (001) substrates using DC magnetron sputtering",
abstract = "Dispersive cobalt nanoparticles are fabricated directly on Si (001) substrates by DC magnetron sputtering at room temperature. During deposition, the parameters chosen for the investigation are substrate bias (from +525 To -100 Volts), target-to-substrate distance (from 6 to 12 cm) and deposition time (from 10 to 30m sec), while the other parameters are kept the same, including the power of 50 watts. Atomic force microscope (AFM) is employed to determine the density and morphology of cobalt nanoparticles whereas high-resolution electron microscope (HRTEM) is used to visualize the resulting microstrucrure in the nanoparticles. It is found that Co nanoparticle array can be formed by combining the optimum substrate bias and target-to-substrate distance. The size uniformity of the nanoparticle array can be enhanced by positive bias due to charging effects. The nanoparticle of as small as a few nanometers can be successfully fabricated by DC-sputtering and can be applied to nanotube growth as catalysts.",
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The microstructure of Co nanoparticles directly deposited on Si (001) substrates using DC magnetron sputtering. / Chung, Bing Xian; Liu, Chuan-Pu; Chen, Jiun Nan.

In: Materials Research Society Symposium - Proceedings, Vol. 737, 25.07.2003, p. 727-731.

Research output: Contribution to journalConference article

TY - JOUR

T1 - The microstructure of Co nanoparticles directly deposited on Si (001) substrates using DC magnetron sputtering

AU - Chung, Bing Xian

AU - Liu, Chuan-Pu

AU - Chen, Jiun Nan

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N2 - Dispersive cobalt nanoparticles are fabricated directly on Si (001) substrates by DC magnetron sputtering at room temperature. During deposition, the parameters chosen for the investigation are substrate bias (from +525 To -100 Volts), target-to-substrate distance (from 6 to 12 cm) and deposition time (from 10 to 30m sec), while the other parameters are kept the same, including the power of 50 watts. Atomic force microscope (AFM) is employed to determine the density and morphology of cobalt nanoparticles whereas high-resolution electron microscope (HRTEM) is used to visualize the resulting microstrucrure in the nanoparticles. It is found that Co nanoparticle array can be formed by combining the optimum substrate bias and target-to-substrate distance. The size uniformity of the nanoparticle array can be enhanced by positive bias due to charging effects. The nanoparticle of as small as a few nanometers can be successfully fabricated by DC-sputtering and can be applied to nanotube growth as catalysts.

AB - Dispersive cobalt nanoparticles are fabricated directly on Si (001) substrates by DC magnetron sputtering at room temperature. During deposition, the parameters chosen for the investigation are substrate bias (from +525 To -100 Volts), target-to-substrate distance (from 6 to 12 cm) and deposition time (from 10 to 30m sec), while the other parameters are kept the same, including the power of 50 watts. Atomic force microscope (AFM) is employed to determine the density and morphology of cobalt nanoparticles whereas high-resolution electron microscope (HRTEM) is used to visualize the resulting microstrucrure in the nanoparticles. It is found that Co nanoparticle array can be formed by combining the optimum substrate bias and target-to-substrate distance. The size uniformity of the nanoparticle array can be enhanced by positive bias due to charging effects. The nanoparticle of as small as a few nanometers can be successfully fabricated by DC-sputtering and can be applied to nanotube growth as catalysts.

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