The morphologies and the chemical states of the multiple zincating deposits on Al pads of Si chips

Kwang Lung Lin, Shiuh Yuan Chang

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

The zincating was conducted on the Al pads ( 100 × 100 × 1.5 (μm3) of silicon chips. Each chip consists of 400 Al pads. The zincating deposition conducted on the Al pads was a three-time multiple zincating process. The first-time zincating lead to larger independent particle deposits, i.e. of poor coverage. The second-time zincating caused very fine, dense particles. The deposits became a continuous film, with only a few vacancies after the third-time zincating. The acidic etching steps between the consecutive zincating operations, tend to refine the deposit nodules. The X-ray photoelectron spectroscopy results revealed that the surface of the as-deposited zincating layer was oxidized, while the intermediate acidic etching tended to eliminate the oxidized surface and lead to elemental zinc.

Original languageEnglish
Pages (from-to)36-40
Number of pages5
JournalThin Solid Films
Volume288
Issue number1-2
DOIs
Publication statusPublished - 1996 Nov 15

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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