Temperature-programmed reaction/desorption, X-ray photoelectron spectroscopy, and reflection-absorption infrared spectroscopy have been employed to investigate the reactions of ICH2CH2OH on Cu(1 0 0) under ultrahigh-vacuum conditions. ICH2CH2OH can dissociate on Cu(1 0 0) at 100 K, forming a -CH2CH2OH surface intermediate. Density functional theory calculations predict that the -CH2CH2OH is most probably adsorbed on atop site. -CH 2CH2OH on Cu(1 0 0) further decomposes to yield C 2H4 below 270 K. No evidence shows the formation of -CH2CH2O- intermediate in the reactions of ICH 2CH2OH on Cu(1 0 0) in contrast to the decomposition of BrCH2CH2OH on Cu(1 0 0) and ICH2CH 2OH on Ag(1 1 1) and Ag(1 1 0), exhibiting the effects of carbon-halogen bonds and metal surfaces.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry