Reflection-absorption infrared spectroscopy (RAIRS) and temperature-programmed reaction/desorption (TPR/D) have been employed to investigate the thermal decomposition of HSCH2CH2OH on Cu(1 0 0) and the surface intermediates involved. The surface reactions of HSCH2CH2OH proceed via several stages in sequence, including production of surface intermediates of -SCH2CH 2OH, -SCH2CH2O-, and the species possibly containing >C=C=O or >C=C=S. Carbon-containing products of CH 4, C2H4, and CH3CHO evolve between 300 and 500 K and C2H4 is the major product. Desorption of sulfur-containing products is not observed. HSCH2CH2OH dissociates on Cu(1 0 0) and oxygen-precovered Cu(1 0 0) to form -SCH 2CH2OH at dosing temperature of 115 K. However -SCH 2CH2O- and the species containing >C=C=O or >C=C=S are generated at lower temperatures on oxygen-precovered Cu(1 0 0). C 2H4 is also the major desorption product from HSCH 2CH2OH on oxygen-precovered Cu(1 0 0).
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry