Abstract
Transparent conducting Nb-doped titanium oxide (NTO) films were deposited on a non-alkali glass substrate using an RF magnetron sputtering method with post-annealing. Structural, electrical and optical properties of the NTO films were found to be strongly dependent on film thickness. A resistivity of 4.2 × 10−3 Ω cm and an average visible transmittance of ∼70% were obtained at the film thickness of 360 nm, indicating that the polycrystalline NTO fabricated by the sputtering method has sufficient potential as a transparent conducting oxide (TCO) candidate for practical applications.
Original language | English |
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Pages (from-to) | 1476-1480 |
Number of pages | 5 |
Journal | Journal of Electronic Materials |
Volume | 46 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2017 Mar 1 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry