Thickness effect on stress-induced exchange anisotropy of NiFe/NiFeMn

Chih Huang Lai, Shing An Chen, J. C.A. Huang

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

Samples with the structure Mo (20 nm)/NiFe (t nm)/NiFeMn (12 nm)/Mo (2 nm) were grown on the Al2O3 (11-20) substrates by a MBE system. Although no magnetic field was applied during depositions, shifted hysteresis loops were observed in as-deposited samples, which were attributable to the stress-induced exchange anisotropy. With increasing thickness of NiFe, the residual stress on NiFe decreased, which resulted in the decrease of NiFe anisotropy. The exchange field decreased with increasing NiFe thickness but with a transition point at t = 12nm, at which the residual stress on top of NiFe might be significantly released.

Original languageEnglish
Pages (from-to)6656-6658
Number of pages3
JournalJournal of Applied Physics
Volume87
Issue number9 III
DOIs
Publication statusPublished - 2000 May 1
Event44th Annual Conference on Magnetism and Magnetic Materials - San Jose, CA, United States
Duration: 1999 Nov 151999 Nov 18

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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