Thin film deposition of semiconducting Ni-Co oxide spinel with adequate electrical and optical properties for energy application

Nickel-cobalt oxide with spinel structure was successfully fabricated using a wet chemical route followed by calcinations at 300 °C. In nickel-cobalt spinel oxide, Ni²⁺ ions occupy the octahedral sites and Co ³⁺ ions are distributed over both octahedral and tetrahedral sites. Very interestingly, nickel-cobalt spinel oxide does not only show a p-type semi-conducting behavior material but also exhibits desired transparency in infrared wavelengths. Electrical and optical properties of the deposited films were investigated as a function of different processing conditions. The sputtering target is fabricated by homogeneously mixing oxide powders and followed by sintering at 1,500 °C. The nickel-cobalt oxide film showed a resistivity as low as 10^-2 Ω-cm by radio frequency (RF) magnetron sputtering in a pure oxygen atmosphere. The sputter-deposited nickel-cobalt oxide films also showed more than 70% transmittance in the infrared range.