Thin film thickness and refractive index measurement by multiple beam interferometry

T. Y. Chen, Y. J. Lin, S. G. Hu, S. L. Yang, J. C. Chung

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The materials will show remarkable different characteristics and phenomenon in the nano-scale. It has become unlackable to build and use precise measurement technologies and systems to understand and control the material characteristics. In this paper, a primary surface force apparatus to measure the thickness and refractive index of thin film is developed based on the multiple beam interferometriy. Using the symmetrical three-layer formula from Israelachvili, a software is designed to analyze the Fringe of Equal Chromatic Order (FECO) produced from multiple beam interferometry. Test of the system on the the experimental FECO is shown. The applicability of the system is validated. Further discussion of the factors that affect the formation of FECO is given.

Original languageEnglish
Title of host publicationFourth International Conference on Experimental Mechanics
DOIs
Publication statusPublished - 2010 Dec 1
Event4th International Conference on Experimental Mechanics - Singapore, Singapore
Duration: 2009 Nov 182009 Nov 20

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7522
ISSN (Print)0277-786X

Other

Other4th International Conference on Experimental Mechanics
Country/TerritorySingapore
CitySingapore
Period09-11-1809-11-20

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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