Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method

Terry Yuan Fang Chen, Chien Chih Chen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The establishment and use of precision measurement technology and system become an important part to understand and to effectively control the materials, structures or installations in nano-scale. In this paper, a system based on the multiple beam interferometry, multi-matrix method and fast spectral correlation method is developed to measure the thickness and refractive index of thin film. Primary study to analyze the FECO images obtained from symmetrical three-layer (mica-air-mica) with film thickness over 200nm and non-symmetrical interference (mica- air- LDPE-mica) was made. The results show that the fast spectral correlation formula can be applied to both symmetric and non-symmetric three-layer interference, and the film thickness measurement is applicable to over 200nm.

Original languageEnglish
Title of host publicationSixth International Symposium on Precision Engineering Measurements and Instrumentation
DOIs
Publication statusPublished - 2010 Dec 1
Event6th International Symposium on Precision Engineering Measurements and Instrumentation - Hangzhou, China
Duration: 2010 Aug 82010 Aug 11

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7544
ISSN (Print)0277-786X

Other

Other6th International Symposium on Precision Engineering Measurements and Instrumentation
CountryChina
CityHangzhou
Period10-08-0810-08-11

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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