Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method

Terry Yuan Fang Chen; Chien Chih Chen

doi:10.1117/12.885457

Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method

Terry Yuan Fang Chen, Chien Chih Chen

Department of Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The establishment and use of precision measurement technology and system become an important part to understand and to effectively control the materials, structures or installations in nano-scale. In this paper, a system based on the multiple beam interferometry, multi-matrix method and fast spectral correlation method is developed to measure the thickness and refractive index of thin film. Primary study to analyze the FECO images obtained from symmetrical three-layer (mica-air-mica) with film thickness over 200nm and non-symmetrical interference (mica- air- LDPE-mica) was made. The results show that the fast spectral correlation formula can be applied to both symmetric and non-symmetric three-layer interference, and the film thickness measurement is applicable to over 200nm.

Original language	English
Title of host publication	Sixth International Symposium on Precision Engineering Measurements and Instrumentation
DOIs	https://doi.org/10.1117/12.885457
Publication status	Published - 2010
Event	6th International Symposium on Precision Engineering Measurements and Instrumentation - Hangzhou, China Duration: 2010 Aug 8 → 2010 Aug 11

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7544
ISSN (Print)	0277-786X

Other

Other	6th International Symposium on Precision Engineering Measurements and Instrumentation
Country/Territory	China
City	Hangzhou
Period	10-08-08 → 10-08-11

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.885457

Cite this

Chen, T. Y. F., & Chen, C. C. (2010). Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method. In Sixth International Symposium on Precision Engineering Measurements and Instrumentation Article 754449 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7544). https://doi.org/10.1117/12.885457

@inproceedings{51179e9e70f4439aabf7cc3e72f4760c,

title = "Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method",

abstract = "The establishment and use of precision measurement technology and system become an important part to understand and to effectively control the materials, structures or installations in nano-scale. In this paper, a system based on the multiple beam interferometry, multi-matrix method and fast spectral correlation method is developed to measure the thickness and refractive index of thin film. Primary study to analyze the FECO images obtained from symmetrical three-layer (mica-air-mica) with film thickness over 200nm and non-symmetrical interference (mica- air- LDPE-mica) was made. The results show that the fast spectral correlation formula can be applied to both symmetric and non-symmetric three-layer interference, and the film thickness measurement is applicable to over 200nm.",

author = "Chen, {Terry Yuan Fang} and Chen, {Chien Chih}",

year = "2010",

doi = "10.1117/12.885457",

language = "English",

isbn = "9780819479402",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Sixth International Symposium on Precision Engineering Measurements and Instrumentation",

note = "6th International Symposium on Precision Engineering Measurements and Instrumentation ; Conference date: 08-08-2010 Through 11-08-2010",

}

Chen, TYF & Chen, CC 2010, Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method. in Sixth International Symposium on Precision Engineering Measurements and Instrumentation., 754449, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7544, 6th International Symposium on Precision Engineering Measurements and Instrumentation, Hangzhou, China, 10-08-08. https://doi.org/10.1117/12.885457

Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method. / Chen, Terry Yuan Fang; Chen, Chien Chih.
Sixth International Symposium on Precision Engineering Measurements and Instrumentation. 2010. 754449 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7544).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method

AU - Chen, Terry Yuan Fang

AU - Chen, Chien Chih

PY - 2010

Y1 - 2010

N2 - The establishment and use of precision measurement technology and system become an important part to understand and to effectively control the materials, structures or installations in nano-scale. In this paper, a system based on the multiple beam interferometry, multi-matrix method and fast spectral correlation method is developed to measure the thickness and refractive index of thin film. Primary study to analyze the FECO images obtained from symmetrical three-layer (mica-air-mica) with film thickness over 200nm and non-symmetrical interference (mica- air- LDPE-mica) was made. The results show that the fast spectral correlation formula can be applied to both symmetric and non-symmetric three-layer interference, and the film thickness measurement is applicable to over 200nm.

AB - The establishment and use of precision measurement technology and system become an important part to understand and to effectively control the materials, structures or installations in nano-scale. In this paper, a system based on the multiple beam interferometry, multi-matrix method and fast spectral correlation method is developed to measure the thickness and refractive index of thin film. Primary study to analyze the FECO images obtained from symmetrical three-layer (mica-air-mica) with film thickness over 200nm and non-symmetrical interference (mica- air- LDPE-mica) was made. The results show that the fast spectral correlation formula can be applied to both symmetric and non-symmetric three-layer interference, and the film thickness measurement is applicable to over 200nm.

UR - http://www.scopus.com/inward/record.url?scp=79952743407&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79952743407&partnerID=8YFLogxK

U2 - 10.1117/12.885457

DO - 10.1117/12.885457

M3 - Conference contribution

AN - SCOPUS:79952743407

SN - 9780819479402

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Sixth International Symposium on Precision Engineering Measurements and Instrumentation

T2 - 6th International Symposium on Precision Engineering Measurements and Instrumentation

Y2 - 8 August 2010 through 11 August 2010

ER -

Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method

Abstract

Publication series

Other

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this