TY - JOUR
T1 - Three Dimensional Maskless Ultraviolet Exposure System Based on Digital Light Processing
AU - Chien, H. L.
AU - Lee, Y. C.
N1 - Funding Information:
This work is sponsored by the Ministry of Science and Technology of Taiwan under contracts of MOST 106-2221-E-006-135-MY2, MOST 106-3114-8-006-003, and MOST 107-2823-8-006-004.
Funding Information:
This work is sponsored by the Ministry of Science and Technology of Taiwan under contracts of MOST 106-2221-E-006-135-MY2, MOST 106-3114-8-006-003, and MOST 107-2823-8-006-004. Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Publisher Copyright:
© 2020, Korean Society for Precision Engineering.
PY - 2020/5/1
Y1 - 2020/5/1
N2 - This paper reports the development of a three dimension maskless photolithography system with an oblique scanning method based on digital light processing technology. The system consists of a UV light source, a digital micromirror device (DMD), a microlens/pinhole array, two optical projection lenses, and a three-axis (xyz) servo-controlled stage. The optical system can form a rectangular array of UV spots with a diameter of few μm directly on the surface of a sample sitting on the stage. A photoresist (PR) layer is coated on the sample surface. Using an oblique scanning approach, the whole area of PR layer can be exposed by this UV exposure system in a maskless manner. Since the energy intensity of each UV spot can be independently modulated by a corresponding group of micromirrors in the DMD, and a three-dimensional (3D) UV dosage distribution can be achieved through computer programming on the DMD and the xyz stage. After developing processes, 3D PR microstructures with arbitrary patterns and/or surface profiles can be readily formed by this maskless lithography system. Experimental results will be addressed as well as potential applications for 2D and 3D microfabrication.
AB - This paper reports the development of a three dimension maskless photolithography system with an oblique scanning method based on digital light processing technology. The system consists of a UV light source, a digital micromirror device (DMD), a microlens/pinhole array, two optical projection lenses, and a three-axis (xyz) servo-controlled stage. The optical system can form a rectangular array of UV spots with a diameter of few μm directly on the surface of a sample sitting on the stage. A photoresist (PR) layer is coated on the sample surface. Using an oblique scanning approach, the whole area of PR layer can be exposed by this UV exposure system in a maskless manner. Since the energy intensity of each UV spot can be independently modulated by a corresponding group of micromirrors in the DMD, and a three-dimensional (3D) UV dosage distribution can be achieved through computer programming on the DMD and the xyz stage. After developing processes, 3D PR microstructures with arbitrary patterns and/or surface profiles can be readily formed by this maskless lithography system. Experimental results will be addressed as well as potential applications for 2D and 3D microfabrication.
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U2 - 10.1007/s12541-020-00318-8
DO - 10.1007/s12541-020-00318-8
M3 - Article
AN - SCOPUS:85078586179
SN - 2234-7593
VL - 21
SP - 937
EP - 945
JO - International Journal of Precision Engineering and Manufacturing
JF - International Journal of Precision Engineering and Manufacturing
IS - 5
ER -