Three-dimensional morphological instabilities in chemical vapor deposition films

Chi-Chuan Hwang, Hwei Yen Yang, Jin Yuan Hsieh, Yuan Mon Dai

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

In this article, an analysis of nonlinear three-dimensional (3-D) morphological instabilities in chemical vapor deposition (CVD) is presented. We establish a set of mathematically governing equation and boundary condition for the system of CVD and derive a weakly nonlinear evolution equation by considering a diffusion-limited growth condition to study the morphological instabilities in the CVD process. This evolution equation not only can predict the behaviors of interfacial growth of films, but can also be a basis of weakly nonlinear analysis. The analysis from critical condition is adopted to investigate the two-dimensional (2-D) band-like cells and the 3-D hexagonal structures.

Original languageEnglish
Pages (from-to)371-380
Number of pages10
JournalThin Solid Films
Volume304
Issue number1-2
DOIs
Publication statusPublished - 1997 Jan 1

Fingerprint

Chemical vapor deposition
vapor deposition
nonlinear evolution equations
Nonlinear analysis
Boundary conditions
boundary conditions
cells

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Hwang, Chi-Chuan ; Yang, Hwei Yen ; Hsieh, Jin Yuan ; Dai, Yuan Mon. / Three-dimensional morphological instabilities in chemical vapor deposition films. In: Thin Solid Films. 1997 ; Vol. 304, No. 1-2. pp. 371-380.
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Three-dimensional morphological instabilities in chemical vapor deposition films. / Hwang, Chi-Chuan; Yang, Hwei Yen; Hsieh, Jin Yuan; Dai, Yuan Mon.

In: Thin Solid Films, Vol. 304, No. 1-2, 01.01.1997, p. 371-380.

Research output: Contribution to journalArticle

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