Total toxicity equivalents emissions of SF6, CHF3, and CCl2F2 decomposed in a RF plasma environment

Ya Fen Wang, Minliang Shih, Cheng Hsien Tsai, Perng Jy Tsai

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17 Citations (Scopus)

Abstract

Sulfur hexafluorine compound (SF6), trifluoromethane (CHF 3) and diclorodifluoromethane (CCl2F2) are extensively used in the semiconductor industry. They are global warming gases. Most studies have addressed the effective decomposition of fluorine compounds, rather than the toxicity of decomposed by-products. Hence, the concepts of toxicity equivalents (TEQs) were applied in this work. The results indicated that HF and SiF4 were the two greatest contributors of TEQ to the SF6/H2/Ar plasma system, while F2 and SiF 4 were the two greatest contributors to the SF6/O 2/Ar system. Additionally, SiF4 and HF were the two greatest contributors of TEQ to both the CHF3/H2/Ar and CHF3/O2/Ar plasma systems. HF and HCl were the two greatest contributors of TEQ to the CCl2F2/H 2/Ar plasma system, and Cl2 and COCl2 were the two greatest contributors to the CCl2F2/O2/Ar system. HCl and HF can be recovered using wet scrubbing, which reduces the toxicity of these emission gases. Consequently, the hydrogen-based plasma system was a better alternative for treating gases that contained SF6, CHF3 and CCl2F2 from the TEQs point of view.

Original languageEnglish
Pages (from-to)1681-1688
Number of pages8
JournalChemosphere
Volume62
Issue number10
DOIs
Publication statusPublished - 2006 Mar

All Science Journal Classification (ASJC) codes

  • Environmental Engineering
  • Environmental Chemistry
  • Chemistry(all)
  • Pollution
  • Health, Toxicology and Mutagenesis

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