Transparent ultrananocrystalline diamond films on quartz substrate

P. T. Joseph, Nyan Hwa Tai, Yi-Chun Chen, Hsiu Fung Cheng, I. Nan Lin

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

Highly transparent ultrananocrystalline diamond (UNCD) films were deposited on quartz substrates using microwave plasma enhanced chemical vapor deposition (MPECVD) method. Low temperature growth of high quality transparent UNCD films was achieved by without heating the substrates prior to the deposition. Additionally, a new method to grow NCD and microcrystalline diamond (MCD) films on quartz substrates has been proposed. Field emission scanning electron microscopy (FESEM) and Raman spectroscopy were used to analyze the surface and structural properties of the films. The surface morphology of UNCD film shows very smooth surface characteristics. The transparent property studies of UNCD film on quartz substrate showed 90% transmittance in the near IR region. The transparent and dielectric properties of UNCD, NCD, and MCD films on quartz substrates were compared and reported.

Original languageEnglish
Pages (from-to)476-480
Number of pages5
JournalDiamond and Related Materials
Volume17
Issue number4-5
DOIs
Publication statusPublished - 2008 Apr 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

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