Transport behavior and negative magnetoresistance in chemically reduced graphene oxide nanofilms

Shu Wei Wang, H. E. Lin, Huang De Lin, K. Y. Chen, Kun Hua Tu, C. W. Chen, Ju Ying Chen, Cheng Hua Liu, C. T. Liang, Y. F. Chen

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29 Citations (Scopus)

Abstract

The electron transport behavior in chemically reduced graphene oxide (rGO) sheets with different thicknesses of 2, 3, and 5nm was investigated. The four-probe method for the sheet resistance (RS) measurement on the intensively reduced graphene oxide samples indicates an Arrhenius characteristic of the electron transport at zero magnetic field B = 0, consistent with previous experimental results on well-reduced GO samples. The anticipated variable range hopping (VRH) transport of electrons in a two-dimensional electron system at low temperatures was not observed. The measured RS of the rGO samples are below 52kΩ/square at room temperature. With the application of a magnetic field up to 4T, negative magnetoresistance in the Mott VRH regime was observed. The magnetotransport features support a model based on the spin-coupling effect from the vacancy-induced midgap states that facilitate the Mott VRH conduction in the presence of an external magnetic field.

Original languageEnglish
Article number335701
JournalNanotechnology
Volume22
Issue number33
DOIs
Publication statusPublished - 2011 Aug 19

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • General Chemistry
  • General Materials Science
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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