Original language | English |
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Title of host publication | International Conference on Solid State Device and materials (SSDM’09) |
Place of Publication | Sendai, Japan |
Publication status | Published - 2009 Oct 7 |
Trap Profile and Bias Temperature Instability of ALD-HfSiON Gate Stacks in Advanced MOSFETs
Shui-Jinn Wang, C. K Chiang, Y. H. Chen, N. C. Su, C. C Huang, H.Y. Huang, C.-H. Wu
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution