Trap Profile and Bias Temperature Instability of ALD-HfSiON Gate Stacks in Advanced MOSFETs

Shui-Jinn Wang, C. K Chiang, Y. H. Chen, N. C. Su, C. C Huang, H.Y. Huang, C.-H. Wu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationInternational Conference on Solid State Device and materials (SSDM’09)
Place of PublicationSendai, Japan
Publication statusPublished - 2009 Oct 7

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