TY - JOUR
T1 - Tribology and oxidation behavior of TiN/AlN nano-multilayer films
AU - Yao, S. H.
AU - Su, Y. L.
AU - Kao, W. H.
AU - Liu, T. H.
N1 - Funding Information:
The authors wish to express their thanks for the finical support by National Science Council under the contract of NSC93-2212-E-309-001. Grateful thanks are specially dedicated to Mr K.L. Yei for help in executing the experiments and to Mr W.C. Liu of Metal Research Center for deposition.
Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.
PY - 2006/4
Y1 - 2006/4
N2 - In this study, a series of TiN/AlN nano-multilayer films were prepared using a new sputtering setup, which features a medium frequency (MF) twin unbalanced magnetron sputtering system (UBMS) and a DC balanced magnetron sputtering system (BMS). The MF (6.78 MHz) twin UBMS, which is a modification of single RF power source system, is a special design of this deposition machine. The UBMS was employed to deposit the AlN film, and the BMS the TiN film. The aim of this study was to obtain, through controlling the deposition conditions, a group of TiN/AlN nano-multilayer films with various periods (λ). Then a series of experiments were conducted to understand their wear and oxidation properties. The results revealed that through controlling of the deposition parameters, the TiN/AlN nano-multilayer films with λ ranging from 2.4 to 67.6 nm were obtained. At λ≦3.6 nm, the nano-multilayers had extremely high hardness and excellent adhesion. The oxidation tests found that the multilayers had obviously better anti-oxidation property, as compared with the single-layer TiN film. The high hardness and good oxidation resistance contributed to very good wear performance of the TiN/AlN nano-multilayer films.
AB - In this study, a series of TiN/AlN nano-multilayer films were prepared using a new sputtering setup, which features a medium frequency (MF) twin unbalanced magnetron sputtering system (UBMS) and a DC balanced magnetron sputtering system (BMS). The MF (6.78 MHz) twin UBMS, which is a modification of single RF power source system, is a special design of this deposition machine. The UBMS was employed to deposit the AlN film, and the BMS the TiN film. The aim of this study was to obtain, through controlling the deposition conditions, a group of TiN/AlN nano-multilayer films with various periods (λ). Then a series of experiments were conducted to understand their wear and oxidation properties. The results revealed that through controlling of the deposition parameters, the TiN/AlN nano-multilayer films with λ ranging from 2.4 to 67.6 nm were obtained. At λ≦3.6 nm, the nano-multilayers had extremely high hardness and excellent adhesion. The oxidation tests found that the multilayers had obviously better anti-oxidation property, as compared with the single-layer TiN film. The high hardness and good oxidation resistance contributed to very good wear performance of the TiN/AlN nano-multilayer films.
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U2 - 10.1016/j.triboint.2005.02.015
DO - 10.1016/j.triboint.2005.02.015
M3 - Article
AN - SCOPUS:28844476153
SN - 0301-679X
VL - 39
SP - 332
EP - 341
JO - Tribology International
JF - Tribology International
IS - 4
ER -