Ultra-shallow junction formation by monolayer doping process in single crystalline Si and Ge for future CMOS devices

Shang Shiun Chuang, Ta Chun Cho, Po Jung Sung, Kuo Hsing Kao, Henry J.H. Chen, Yao Jen Lee, Michael I. Current, Tseung Yuen Tseng

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Ultra-shallow junction formation by monolayer doping process in single crystalline Si and Ge for future CMOS devices'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds