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Ultra-shallow junction formation by monolayer doping process in single crystalline Si and Ge for future CMOS devices

  • Shang Shiun Chuang
  • , Ta Chun Cho
  • , Po Jung Sung
  • , Kuo Hsing Kao
  • , Henry J.H. Chen
  • , Yao Jen Lee
  • , Michael I. Current
  • , Tseung Yuen Tseng

Research output: Contribution to journal › Article › peer-review

14   Link opens in a new tab Citations (Scopus)

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