Ultraviolet nanoimprint lithography

Jun Taniguchi; Noriyuki Unno; Hidetoshi Shinohara; Jun Mizuno; Hiroshi Goto; Nobuji Sakai; Kentaro Tsunozaki; Hiroto Miyake; Norio Yoshino; Kenichi Kotaki

doi:10.1002/9781118535059.ch5

Ultraviolet nanoimprint lithography

Jun Taniguchi, Noriyuki Unno, Hidetoshi Shinohara, Jun Mizuno, Hiroshi Goto, Nobuji Sakai, Kentaro Tsunozaki, Hiroto Miyake, Norio Yoshino, Kenichi Kotaki

Program on Smart and Sustainable Manufacturing

Research output: Chapter in Book/Report/Conference proceeding › Chapter

Abstract

This chapter describes the phenomena of ultraviolet nanoimprint lithography (UV-NIL) transfer process, UV-NIL machine, UV-NIL materials, and evaluation of mold and transfer resin surface. In UV-NIL, a liquid resin having a low viscosity is used, thus, the required transfer pressure is lower than that of thermal NIL. The chapter describes the self-assembled monolayer (SAM) release agent and its coating method. Resin is classified according to the polymerization system into several types: radical polymerization type, ion polymerization type, and ene-thiol type. The properties of resins with different types of curing mechanism and developmental examples are described. The chapter describes what silane coupling agents are, and explains the mechanism by which the agents modify the surface of the substrate.

Original language	English
Title of host publication	Nanoimprint Technology
Subtitle of host publication	Nanotransfer for Thermoplastic and Photocurable Polymers
Publisher	wiley
Pages	91-168
Number of pages	78
ISBN (Electronic)	9781118535059
ISBN (Print)	9781118359839
DOIs	https://doi.org/10.1002/9781118535059.ch5
Publication status	Published - 2013 Jun 18

All Science Journal Classification (ASJC) codes

General Engineering

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10.1002/9781118535059.ch5

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abstract = "This chapter describes the phenomena of ultraviolet nanoimprint lithography (UV-NIL) transfer process, UV-NIL machine, UV-NIL materials, and evaluation of mold and transfer resin surface. In UV-NIL, a liquid resin having a low viscosity is used, thus, the required transfer pressure is lower than that of thermal NIL. The chapter describes the self-assembled monolayer (SAM) release agent and its coating method. Resin is classified according to the polymerization system into several types: radical polymerization type, ion polymerization type, and ene-thiol type. The properties of resins with different types of curing mechanism and developmental examples are described. The chapter describes what silane coupling agents are, and explains the mechanism by which the agents modify the surface of the substrate.",

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AU - Taniguchi, Jun

AU - Unno, Noriyuki

AU - Shinohara, Hidetoshi

AU - Mizuno, Jun

AU - Goto, Hiroshi

AU - Sakai, Nobuji

AU - Tsunozaki, Kentaro

AU - Miyake, Hiroto

AU - Yoshino, Norio

AU - Kotaki, Kenichi

PY - 2013/6/18

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Ultraviolet nanoimprint lithography

Abstract

All Science Journal Classification (ASJC) codes

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