UV-nanoimprint for 9 GHz SAW filter fabrication

Nian Huei Chen, Chen Liang Liao, Henry J.H. Chen, Chun-Hung Lin, Fon Shan Huang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

A 8 GHz surface acoustic wave (SAW) filter was fabricated by UV nanoimprint lithography (UV-NIL). The key techniques to produce SAW filter include stamp and interdigital transducer (IDT). For stamp, high aspect ratio HSQ/ITO/glass stamp was first exposed by low dose e-beam writer and the proper post-exposure bake (PEB) temperature. The suitable TMAH concentration, temperature, and etching time were utilized to pattern perfect vertical sidewall of the HSQ stamp. Afterwards, the pattern was transferred on UV-curable resist / LiNbO 3 by UV-NIL at room temperature and low pressure. Al/Ti IDTs were then deposited on LiNbO3 for lift-off process. IDTs with feature size 100nm and thickness 20nm can be obtained. Central frequency of SAW filter is as high as 8 GHz. The SEM images depict the fabricated stamps, imprinted features and Al/Ti IDTs. Network analyzer HP8510C was used to examine electrical characterization of SAW filter.

Original languageEnglish
Title of host publicationTechnical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008
Pages211-214
Number of pages4
Publication statusPublished - 2008 Oct 1
Event2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008 - Quebec City, QC, United States
Duration: 2008 Jun 12008 Jun 5

Publication series

NameTechnical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008
Volume3

Other

Other2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008
Country/TerritoryUnited States
CityQuebec City, QC
Period08-06-0108-06-05

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

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