TY - GEN
T1 - UV-nanoimprint for 9 GHz SAW filter fabrication
AU - Chen, Nian Huei
AU - Liao, Chen Liang
AU - Chen, Henry J.H.
AU - Lin, Chun-Hung
AU - Huang, Fon Shan
PY - 2008/10/1
Y1 - 2008/10/1
N2 - A 8 GHz surface acoustic wave (SAW) filter was fabricated by UV nanoimprint lithography (UV-NIL). The key techniques to produce SAW filter include stamp and interdigital transducer (IDT). For stamp, high aspect ratio HSQ/ITO/glass stamp was first exposed by low dose e-beam writer and the proper post-exposure bake (PEB) temperature. The suitable TMAH concentration, temperature, and etching time were utilized to pattern perfect vertical sidewall of the HSQ stamp. Afterwards, the pattern was transferred on UV-curable resist / LiNbO 3 by UV-NIL at room temperature and low pressure. Al/Ti IDTs were then deposited on LiNbO3 for lift-off process. IDTs with feature size 100nm and thickness 20nm can be obtained. Central frequency of SAW filter is as high as 8 GHz. The SEM images depict the fabricated stamps, imprinted features and Al/Ti IDTs. Network analyzer HP8510C was used to examine electrical characterization of SAW filter.
AB - A 8 GHz surface acoustic wave (SAW) filter was fabricated by UV nanoimprint lithography (UV-NIL). The key techniques to produce SAW filter include stamp and interdigital transducer (IDT). For stamp, high aspect ratio HSQ/ITO/glass stamp was first exposed by low dose e-beam writer and the proper post-exposure bake (PEB) temperature. The suitable TMAH concentration, temperature, and etching time were utilized to pattern perfect vertical sidewall of the HSQ stamp. Afterwards, the pattern was transferred on UV-curable resist / LiNbO 3 by UV-NIL at room temperature and low pressure. Al/Ti IDTs were then deposited on LiNbO3 for lift-off process. IDTs with feature size 100nm and thickness 20nm can be obtained. Central frequency of SAW filter is as high as 8 GHz. The SEM images depict the fabricated stamps, imprinted features and Al/Ti IDTs. Network analyzer HP8510C was used to examine electrical characterization of SAW filter.
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M3 - Conference contribution
AN - SCOPUS:52649109671
SN - 9781420085075
SN - 9781420085051
T3 - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008
SP - 211
EP - 214
BT - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008
T2 - 2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008
Y2 - 1 June 2008 through 5 June 2008
ER -