V-band high-isolation CMOS T/R switch fabricated using 90-nm CMOS technology

Chi Shin Kuo, Hsin Chih Kuo, Huey Ru Chuang, Chu Yu Chen, Tzuen Hsi Huang, Guo Wei Huang

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

This article presents a V-band high-isolation complementary metal-oxide semiconductor (CMOS) single-pole double-throw transmitter/receiver (T/R) switch fabricated with TSMC standard 90-nm 1P9M CMOS technology. A low insertion loss and high linearity are achieved using the body-floating technique. In addition, the leakage cancellation technique is used to increase the isolation between the transmitter and receiver ports. The measured results show the insertion loss from the transmitter port to the antenna port is less than 3.5 dB, and the isolation between the transmitter and receiver ports is higher than 28 dB from 57 to 64 GHz. At the center frequency of 60 GHz, the port isolation is higher than 34 dB. The switch isolation has also been measured under the large signal test which is not reported in the previous works.

Original languageEnglish
Pages (from-to)1118-1123
Number of pages6
JournalMicrowave and Optical Technology Letters
Volume54
Issue number5
DOIs
Publication statusPublished - 2012 May

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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