Vapor breakdown during ablation by nanosecond laser pulses

C. L. Liu, J. N. Leboeuf, R. F. Wood, D. B. Geohegan, J. M. Donato, Kuan-Ren Chen, A. A. Puretzky

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

Plasma generation through vapor breakdown during ablation of a Si target by nanosecond KrF laser pulses is modeled using O-dimensional rate equations. Although there is some previous work on vapor breakdown by microsecond laser pulses, there have been no successful attempts reported on the same subject by nanosecond laser pulses. This work intends to fill the gap. A kinetic model is developed considering the following factors: (1) temperatures of both electrons and heavy-body particles (ions, neutrals, and excited states of neutrals), (2) absorption mechanisms of the laser energy such as inverse bremstrahlung (IB) processes and photoionization of excited states, (3) ionization acceleration mechanisms that include electron-impact excitation of ground state neutrals, electron-impact ionization of excited states of neutrals, photoionization of excited states of neutrals, and all necessary reverse processes. The rates of various processes considered are calculated using a second order predictor-corrector numerical scheme. The rate equations are solved for five quantities, namely, densities of electrons, neutrals, and excited states of neutrals, and the temperatures of electrons and heavy-body particles. The total breakdown times (sum of evaporation time and vapor breakdown time) at different energy fluences are then calculated. The results are compared with experimental observations of Si target ablation using a KrF laser.

Original languageEnglish
Pages (from-to)133-138
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume388
Publication statusPublished - 1995 Dec 1
EventProceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA
Duration: 1995 Apr 171995 Apr 20

Fingerprint

Ablation
Excited states
ablation
Laser pulses
breakdown
Vapors
vapors
pulses
Photoionization
Electrons
excitation
lasers
electron impact
photoionization
Impact ionization
Lasers
ionization
plasma generators
electrons
Electron energy levels

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Liu, C. L., Leboeuf, J. N., Wood, R. F., Geohegan, D. B., Donato, J. M., Chen, K-R., & Puretzky, A. A. (1995). Vapor breakdown during ablation by nanosecond laser pulses. Materials Research Society Symposium - Proceedings, 388, 133-138.
Liu, C. L. ; Leboeuf, J. N. ; Wood, R. F. ; Geohegan, D. B. ; Donato, J. M. ; Chen, Kuan-Ren ; Puretzky, A. A. / Vapor breakdown during ablation by nanosecond laser pulses. In: Materials Research Society Symposium - Proceedings. 1995 ; Vol. 388. pp. 133-138.
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abstract = "Plasma generation through vapor breakdown during ablation of a Si target by nanosecond KrF laser pulses is modeled using O-dimensional rate equations. Although there is some previous work on vapor breakdown by microsecond laser pulses, there have been no successful attempts reported on the same subject by nanosecond laser pulses. This work intends to fill the gap. A kinetic model is developed considering the following factors: (1) temperatures of both electrons and heavy-body particles (ions, neutrals, and excited states of neutrals), (2) absorption mechanisms of the laser energy such as inverse bremstrahlung (IB) processes and photoionization of excited states, (3) ionization acceleration mechanisms that include electron-impact excitation of ground state neutrals, electron-impact ionization of excited states of neutrals, photoionization of excited states of neutrals, and all necessary reverse processes. The rates of various processes considered are calculated using a second order predictor-corrector numerical scheme. The rate equations are solved for five quantities, namely, densities of electrons, neutrals, and excited states of neutrals, and the temperatures of electrons and heavy-body particles. The total breakdown times (sum of evaporation time and vapor breakdown time) at different energy fluences are then calculated. The results are compared with experimental observations of Si target ablation using a KrF laser.",
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Liu, CL, Leboeuf, JN, Wood, RF, Geohegan, DB, Donato, JM, Chen, K-R & Puretzky, AA 1995, 'Vapor breakdown during ablation by nanosecond laser pulses', Materials Research Society Symposium - Proceedings, vol. 388, pp. 133-138.

Vapor breakdown during ablation by nanosecond laser pulses. / Liu, C. L.; Leboeuf, J. N.; Wood, R. F.; Geohegan, D. B.; Donato, J. M.; Chen, Kuan-Ren; Puretzky, A. A.

In: Materials Research Society Symposium - Proceedings, Vol. 388, 01.12.1995, p. 133-138.

Research output: Contribution to journalConference article

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T1 - Vapor breakdown during ablation by nanosecond laser pulses

AU - Liu, C. L.

AU - Leboeuf, J. N.

AU - Wood, R. F.

AU - Geohegan, D. B.

AU - Donato, J. M.

AU - Chen, Kuan-Ren

AU - Puretzky, A. A.

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N2 - Plasma generation through vapor breakdown during ablation of a Si target by nanosecond KrF laser pulses is modeled using O-dimensional rate equations. Although there is some previous work on vapor breakdown by microsecond laser pulses, there have been no successful attempts reported on the same subject by nanosecond laser pulses. This work intends to fill the gap. A kinetic model is developed considering the following factors: (1) temperatures of both electrons and heavy-body particles (ions, neutrals, and excited states of neutrals), (2) absorption mechanisms of the laser energy such as inverse bremstrahlung (IB) processes and photoionization of excited states, (3) ionization acceleration mechanisms that include electron-impact excitation of ground state neutrals, electron-impact ionization of excited states of neutrals, photoionization of excited states of neutrals, and all necessary reverse processes. The rates of various processes considered are calculated using a second order predictor-corrector numerical scheme. The rate equations are solved for five quantities, namely, densities of electrons, neutrals, and excited states of neutrals, and the temperatures of electrons and heavy-body particles. The total breakdown times (sum of evaporation time and vapor breakdown time) at different energy fluences are then calculated. The results are compared with experimental observations of Si target ablation using a KrF laser.

AB - Plasma generation through vapor breakdown during ablation of a Si target by nanosecond KrF laser pulses is modeled using O-dimensional rate equations. Although there is some previous work on vapor breakdown by microsecond laser pulses, there have been no successful attempts reported on the same subject by nanosecond laser pulses. This work intends to fill the gap. A kinetic model is developed considering the following factors: (1) temperatures of both electrons and heavy-body particles (ions, neutrals, and excited states of neutrals), (2) absorption mechanisms of the laser energy such as inverse bremstrahlung (IB) processes and photoionization of excited states, (3) ionization acceleration mechanisms that include electron-impact excitation of ground state neutrals, electron-impact ionization of excited states of neutrals, photoionization of excited states of neutrals, and all necessary reverse processes. The rates of various processes considered are calculated using a second order predictor-corrector numerical scheme. The rate equations are solved for five quantities, namely, densities of electrons, neutrals, and excited states of neutrals, and the temperatures of electrons and heavy-body particles. The total breakdown times (sum of evaporation time and vapor breakdown time) at different energy fluences are then calculated. The results are compared with experimental observations of Si target ablation using a KrF laser.

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Liu CL, Leboeuf JN, Wood RF, Geohegan DB, Donato JM, Chen K-R et al. Vapor breakdown during ablation by nanosecond laser pulses. Materials Research Society Symposium - Proceedings. 1995 Dec 1;388:133-138.