XPS CHARACTERIZATION OF SILICON ETCHED IN SF6 plus N2O AND SF6 plus O2 RF PLASMAS.

Yon-Hua Tzeng, T. H. Lin, B. J. Tatarchuk, D. M. Littrell, J. H. Sanders

Research output: Contribution to journalConference articlepeer-review

Fingerprint Dive into the research topics of 'XPS CHARACTERIZATION OF SILICON ETCHED IN SF6 plus N2O AND SF6 plus O2 RF PLASMAS.'. Together they form a unique fingerprint.

Engineering & Materials Science