Abstract
In this study, we have grown the nano-structural ZnOZnO:Al film as anti-reflection coating layer on triple junction solar cells and subsequently characterized their performances. In spite of the superior electrical characteristics of ZnO:Al layer deposited by radio frequency sputtering, a large reflectance of ZnO:Al film on GaAs leads to reduction of incident light. With nano-structural ZnOZnO:Al antireflection coating layer implemented, the conversion efficiency of GaAs based triple junction solar cells have enhanced from 21 to 26.2 under AM 1.5 global illumination (100 mwcm 2) and it can be further improved up to 32 with 160-sun illumination.
Original language | English |
---|---|
Pages (from-to) | H208-H210 |
Journal | Electrochemical and Solid-State Letters |
Volume | 15 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2012 |
All Science Journal Classification (ASJC) codes
- General Chemical Engineering
- General Materials Science
- Physical and Theoretical Chemistry
- Electrochemistry
- Electrical and Electronic Engineering