ZnO nanostructures prepared on LiAlO2 substrates by chemical vapor deposition

Y. T. Tu, C. H. Chen, C. Y.J. Lu, T. H. Huang, T. Yan, J. J. Wu, M. M.C. Chou, L. Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A two-step process of chemical vapor deposition for growing ZnO nanostructures on γ -LiAlO2 (100) substrate was proposed. By taking advantage of the dual orientation characteristic of the substrate, scattered islands with a { 101 0} azimuth orientation were first grown at 650 °C to serve as a mask followed by a second-step process at relatively low temperatures of 450-500 °C to grow {0001} oriented nanostructures. Two examples were given in this paper. Nanorods of 50-200 nm in size were prepared at a high growing pressure of 2.7x104 Pa, and nanocones were obtained at 6.7x103 Pa. The density of the nanostructures can be controlled by the growing time of the first-step process. Both nanostructures were free from threading dislocations and showed good luminescence characteristics.

Original languageEnglish
Title of host publicationThermal and Plasma CVD of Nanostructures and Their Applications
PublisherElectrochemical Society Inc.
Pages13-19
Number of pages7
Edition31
ISBN (Electronic)9781623320546
ISBN (Print)9781623320546
DOIs
Publication statusPublished - 2012
EventSymposium on Thermal and Plasma CVD of Nanostructures and Their Applications - 221st ECS Meeting - Seattle, WA, United States
Duration: 2012 May 62012 May 10

Publication series

NameECS Transactions
Number31
Volume45
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherSymposium on Thermal and Plasma CVD of Nanostructures and Their Applications - 221st ECS Meeting
Country/TerritoryUnited States
CitySeattle, WA
Period12-05-0612-05-10

All Science Journal Classification (ASJC) codes

  • General Engineering

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