Nanoimprinting Lithography For Fabrication of High Frequency Surface Acoustic Wave Device

  • 朱 致瑋

Student thesis: Doctoral Thesis


This thesis describes a new method to fabricated high-frequency surface acoustic wave (SAW) device with the new method known as flexible nanoimprint lithography(FNIL) we can fabricated SAW devices with a 820 nm pitch 860 nm pitch and the frequency of fabricated SAW devices can reach 2 45 GHz and 2 34 GHz The nano-imprint technology used in this research is to use flexible nano-patterned imprint lithography combined with hot embossing nano-imprinting lithography This nano-imprint technology has two key points First to improve the imprinting system this study designed a heating plate and a gas supply tool that can be quickly disassembled and installed by the pneumatic assisted tool This pneumatic assisted tool allows the nanoimprint mold to produce a curved surface that can be used during the imprinting process Complete contact attachment and even pressure on the polymer to increase the consistency of the residual layer in a large area Second the use of perfluoropolyether PFPE (Perfluoropolyethers) as a material to create a flexible nano-level imprint mold on a 4-inch lithium tantalate (LiTaO3) substrate to complete a large-area patterned structure and shorten the imprint process time The characteristics of this PFPE stamp are high resolution low cost flexibility and good demolding ability On the other hand the high-frequency components produced in this paper will discuss the trend changes in the frequency response of changing the number of electrode pairs overlap length number of reflective gate pairs and electrode line width so as to facilitate the design of accurate surface acoustic wave devices in the future
Date of Award2020
Original languageEnglish
SupervisorYung-Chun Lee (Supervisor)

Cite this