Nanoindentation Behaviour and Microstructure of TiO2/GaAs Thin Film with and without Annealing

Abstract

The mechanical properties of TiO2/GaAs thin films with and without annealing indented at room temperatures of different depth were measured by using a nanoindentation technique The specimens were annealed at the temperature 300℃ for 3 hours The result show that the pop-in effect appeared at the load-depth curve randomly for the annealed specimen indented at room temperature The delamination of the thin film from the substrate were also observed After annealing the load-depth curve become not smooth and both the hardness and Young’s modulus were found to increase Furthermore dislocations density increased significantly as the indentation depth is increased The changes in microstructure and mechanical properties were also discussed in terms of annealing indentation depth and thickness of the thin film

Date of Award	2019
Original language	English
Supervisor	Woei-Shyan Lee (Supervisor)