每年研究計畫
個人檔案
學歷
- 2000 國立交通大學電子研究所博士
研究專長
- 電子陶瓷
- 有機薄膜電晶體
- 射頻陶瓷元件
- 系統構裝
- 半導體薄膜製程
- 薄膜太陽能電池
經歷
- 1991~ 1996 台灣飛利浦建元電子開發部(主任)工程師
- 1996~ 1998 台灣飛利浦建元電子開發部組經理
- 1998~ 1999 德國Philips Aachen Lab.研究員
- 1999~ 2000 台灣飛利浦亞太營運被動元件事業處陶瓷材料開發部經理
- 2000~ 2003 飛元科技高頻陶瓷元件開發部經理
- 2003~2006 國立成功大學電機工程系助理教授
- 2007 ~迄今 國立成功大學電機工程系副教授
指紋 查看啟用 Wen-Shi Lee 的研究主題。這些主題標籤來自此人的作品。共同形成了獨特的指紋。
- 9 類似的檔案
Sintering
Engineering & Materials Science
Dielectric properties
Engineering & Materials Science
Multilayers
Engineering & Materials Science
Annealing
Engineering & Materials Science
ceramics
Physics & Astronomy
Copper
Engineering & Materials Science
Electroplating
Engineering & Materials Science
Ceramic capacitors
Engineering & Materials Science
網絡
國家層面的近期外部合作。點選圓點深入探索詳細資料。
研究計畫 2003 2019
研究成果 2000 2019
Characteristic of high frequency Fe-Si-Cr material for motor application by selective laser melting
Jhong, K. J., Chang, T. W., Lee, W. H., Tsai, M. C. & Jiang, I. H., 2019 三月 1, 於 : AIP Advances. 9, 3, 035317.研究成果: Article
開啟存取
electric motors
melting
electromagnetic properties
eddy currents
printing
Effect of annealing conditions on dopants activation and stress conservation in silicon-germanium
Kuo, T. C., Jhong, K. J., Lin, C. W. & Lee, W-S., 2019 一月 1, 於 : AIP Advances. 9, 1, 015110.研究成果: Article
conservation
germanium
activation
annealing
silicon
Effect of pretreatment on Al2O3 substrate by depositing Al2O3 film on the properties of Ni–Cr–Si based thin film resistor
Chung, K. C. & Lee, W-S., 2019 五月 15, 於 : Materials Chemistry and Physics. 234, p. 311-317 7 p.研究成果: Article
Aluminum Oxide
resistors
pretreatment
Resistors
aluminum oxides
High Dopant Activation of Boron in SiGe with two-step Implantation and Microwave Annealing
Kuo, T. C., Lin, C. Y., Lee, W. H., Lin, G. P., Hu, S. Y., Walther, S., Su, Y. H. & Mehta, S., 2018 九月, 2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings. Haublein, V. & Ryssel, H. (編輯). Institute of Electrical and Electronics Engineers Inc., p. 50-53 4 p. 8807977. (Proceedings of the International Conference on Ion Implantation Technology; 卷 2018-September).研究成果: Conference contribution
Boron
Ion implantation
implantation
boron
Chemical activation
1
引文
(Scopus)
Neutral beam and ICP etching of HKMG MOS capacitors: Observations and a plasma-induced damage model
Kuo, T. C., Shih, T. L., Su, Y. H., Lee, W-S., Current, M. I. & Samukawa, S., 2018 四月 28, 於 : Journal of Applied Physics. 123, 16, 161517.研究成果: Article
neutral beams
metal oxide semiconductors
capacitors
etching
damage
論文
A Kinetic Study of Silver Nitrate and Copper Ion by Replacement Reaction
作者: 婉菱, 龔., 2015 二月 13監督員: Lee, W. (Supervisor)
學生論文: Master's Thesis
A Study on Co-electrodeposition of Copper-Nickel Alloys and Characteristics after Annealing
作者: 丘翎, 鄭., 2018 八月 28監督員: Lee, W. (Supervisor)
學生論文: Master's Thesis
A Study on Electrochemical and Barrier Properties of Cobalt-tungsten Alloy as multi-purpose diffusion barrier for Next-generation Cu metallization
作者: 煒翔, 曾., 2014 八月 19監督員: Lee, W. (Supervisor)
學生論文: Master's Thesis
A Study on Electrochemical and Physical Properties of Tantalum Ruthenium and Cobalt-based Materials as Multi-purpose Diffusion Barrier for Next-generation Cu Metallization
作者: 喻生, 王., 2014 七月 25監督員: Lee, W. (Supervisor)
學生論文: Doctoral Thesis
A Study on Metallization of N-PERT c-Si Solar Cells by Using Copper Electrochemical Deposition
作者: 羽捷, 鍾., 2016 八月 22監督員: Lee, W. (Supervisor)
學生論文: Master's Thesis