400nm InGaN/GaN and InGaN/AlGaN multiquantum well light-emitting diodes

S. J. Chang, C. H. Kuo, Y. K. Su, L. W. Wu, J. K. Sheu, T. C. Wen, W. C. Lai, J. F. Chen, J. M. Tsai

研究成果: Conference contribution

摘要

400 nm In0.05Ga0.95N/GaN MQW light emitting diode (LED) structure and In0.05Ga0.95N/Al0.1Ga0.9N LED structure were both prepared by organometallic vapor phase epitaxy (OMVPE). It was found that the use of Al0.1Ga0.9N as the material for barrier layers would not degrade crystal quality of the epitaxial layers. It was also found that the 20 mA electroluminescence (EL) intensity of InGaN/AlGaN multiquantum well (MQW) LED was two times larger than that of the InGaN/GaN MQW LED. The larger maximum output intensity and the fact that maximum output intensity occurred at larger injection current suggest that AlGaN barrier layers can provide a better carrier confinement and effectively reduce leakage current.

原文English
主出版物標題Proceedings of the 6th Chinese Optoelectronics Symposium, COES 2003
編輯K. T. Chan, H. S. Kwok
發行者Institute of Electrical and Electronics Engineers Inc.
頁面91-94
頁數4
ISBN(電子)0780378873, 9780780378872
DOIs
出版狀態Published - 2003
事件6th Chinese Optoelectronics Symposium, COES 2003 - Hong Kong, China
持續時間: 2003 九月 122003 九月 14

出版系列

名字Proceedings of the 6th Chinese Optoelectronics Symposium, COES 2003

Other

Other6th Chinese Optoelectronics Symposium, COES 2003
國家China
城市Hong Kong
期間03-09-1203-09-14

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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