摘要
The authors report the fabrication of a 3-D ZnO-nanowire/MOSFET smart photo sensor using through silicon via technology. It was found that the MOSFET, prepared by hot-wire chemical vapor deposition, exhibits standard saturation and pinch-off characteristics. The dynamic response of the 3-D ZnO-nanowire/MOSFET smart photo sensor was stable and reproducible with an ON-OFF current contrast ratio larger than one order of magnitude. As we turned OFF the ultraviolet illumination, it was found that the decay time was smaller than 1 s for the 3-D ZnO-nanowire/MOSFET smart photo sensor, which was significantly shorter than that observed from the conventional ZnO nanowire photo sensor.
原文 | English |
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文章編號 | 7509662 |
頁(從 - 到) | 3562-3566 |
頁數 | 5 |
期刊 | IEEE Transactions on Electron Devices |
卷 | 63 |
發行號 | 9 |
DOIs | |
出版狀態 | Published - 2016 9月 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 電氣與電子工程