A hybrid nano-imprinting lithography based on infrared pulsed laser heating

Yung Chun Lee, Chun Hung Chen, Chuan Pu Liu

研究成果: Conference contribution

摘要

In this paper we present a novel method of nano-imprinting which adopts important features of conventional nano-imprinting lithography (NIL) and the newly developed laser-assisted direct imprinting (LADI) method. It utilizes an Nd-YAG pulsed laser of wavelength 1064 nm which can easily penetrate and also heat up a silicon mold which is pressed against a resist layer deposited on a substrate. The fast rising temperature in the silicon mold can momentarily melt the resist layer so that the mold is imprinting into the resist layer. After the pattern is transformed, standard nano-imprinting lithography processes can be applied to the substrate for nano-fabrication. This new method has several advantages over existing nano-imprinting methods mostly due to the fast heating-up of silicon mold by high intensity IR laser pulse and therefore has no thermal drifting problem. Both the theoretical modeling and experimental results of this novel IR-laser assisted imprinting method will be presented.

原文English
主出版物標題Proceedings of 1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS
頁面6-10
頁數5
DOIs
出版狀態Published - 2006
事件1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS - Zhuhai, China
持續時間: 2006 一月 182006 一月 21

出版系列

名字Proceedings of 1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS

Other

Other1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS
國家/地區China
城市Zhuhai
期間06-01-1806-01-21

All Science Journal Classification (ASJC) codes

  • 生物技術
  • 材料科學(雜項)

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