A metal-embedded photo-mask for contact photolithography with application on patterned sapphire substrate

Jhih Nan Yan, Cho Wei Chang, Yung Chun Lee

研究成果: Article同行評審

2 引文 斯高帕斯(Scopus)

摘要

This paper describes the fabrication processes of a new type of photo-masks, named metal-embedded photo-masks, which can be used in standard contact-type photolithography. This metal-embedded photo-mask is prepared by metal contact printing method and can easily achieve a line-width at sub-micrometer scales. The fabrication processes can be easily implemented and the cost of making a high-resolution photo-mask is significantly reduced. Both 2″ and 4″ quartz photo-masks with a line-width of 1 μm and 0.5 μm are successfully fabricated. Experimental patterning of photo-resist layers using these metal-embedded photo-masks are carried out. Applications of these photo-masks on fabricating high-quality patterned sapphire substrates (PSSs) used in light-emitting diode (LED) industry are experimentally demonstrated.

原文English
頁(從 - 到)20-24
頁數5
期刊Microelectronic Engineering
122
DOIs
出版狀態Published - 2014 6月 25

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 凝聚態物理學
  • 表面、塗料和薄膜
  • 電氣與電子工程

指紋

深入研究「A metal-embedded photo-mask for contact photolithography with application on patterned sapphire substrate」主題。共同形成了獨特的指紋。

引用此