A new micro/nano-Lithography based on contact transfer of thin film and Mask Embedded Lithography

Yung Chun Lee, Cheng Yu Chiu, Shuo Hung Chang

研究成果: Conference contribution

摘要

This paper presents a new nanoimprint method based on the Contact Transfer and Mask Embedded Lithography (CMEL) technique. In CMEL process, a thin metal film is deposited on the silicon mold treated with an anti-adhesion layer. The mold contacts with a liquid phase of PMMA layer on the silicon substrate by applying a uniform pressure on the both sides of the mold and the substrate. After removing the mold, the thin film is embedded onto the PMMA resist as an etching mask for the sub-sequential etching process. In the results of experiments, CMEL has demonstrated the linear grating and dot-array with the feature size around 200 to 500 nm successfully. Compared with other nanoimpint methods, CMEL is a "Green" nanoimprint technique because its process is simple and consumes no energy to assist the mold to form the nanostructures.

原文English
主出版物標題3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
頁面239-242
頁數4
DOIs
出版狀態Published - 2008 九月 1
事件3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 - Sanya, China
持續時間: 2008 一月 62008 一月 9

出版系列

名字3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS

Other

Other3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
國家China
城市Sanya
期間08-01-0608-01-09

指紋

Lithography
Masks
Thin films
Etching
Silicon
Substrates
Contacts (fluid mechanics)
Nanostructures
Adhesion
Liquids
Metals
Experiments

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

引用此文

Lee, Y. C., Chiu, C. Y., & Chang, S. H. (2008). A new micro/nano-Lithography based on contact transfer of thin film and Mask Embedded Lithography. 於 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 (頁 239-242). [4484326] (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS). https://doi.org/10.1109/NEMS.2008.4484326
Lee, Yung Chun ; Chiu, Cheng Yu ; Chang, Shuo Hung. / A new micro/nano-Lithography based on contact transfer of thin film and Mask Embedded Lithography. 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. 2008. 頁 239-242 (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS).
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abstract = "This paper presents a new nanoimprint method based on the Contact Transfer and Mask Embedded Lithography (CMEL) technique. In CMEL process, a thin metal film is deposited on the silicon mold treated with an anti-adhesion layer. The mold contacts with a liquid phase of PMMA layer on the silicon substrate by applying a uniform pressure on the both sides of the mold and the substrate. After removing the mold, the thin film is embedded onto the PMMA resist as an etching mask for the sub-sequential etching process. In the results of experiments, CMEL has demonstrated the linear grating and dot-array with the feature size around 200 to 500 nm successfully. Compared with other nanoimpint methods, CMEL is a {"}Green{"} nanoimprint technique because its process is simple and consumes no energy to assist the mold to form the nanostructures.",
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Lee, YC, Chiu, CY & Chang, SH 2008, A new micro/nano-Lithography based on contact transfer of thin film and Mask Embedded Lithography. 於 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008., 4484326, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS, 頁 239-242, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008, Sanya, China, 08-01-06. https://doi.org/10.1109/NEMS.2008.4484326

A new micro/nano-Lithography based on contact transfer of thin film and Mask Embedded Lithography. / Lee, Yung Chun; Chiu, Cheng Yu; Chang, Shuo Hung.

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. 2008. p. 239-242 4484326 (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS).

研究成果: Conference contribution

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Lee YC, Chiu CY, Chang SH. A new micro/nano-Lithography based on contact transfer of thin film and Mask Embedded Lithography. 於 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. 2008. p. 239-242. 4484326. (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS). https://doi.org/10.1109/NEMS.2008.4484326