A nonlinear three-dimensional rupture theory of thin liquid films

Chi Chuan Hwang, Chaur Kie Lin, Wu Yih Uen

研究成果: Article同行評審

25 引文 斯高帕斯(Scopus)

摘要

A process of nonlinear three-dimensional rupture of thin liquid films is numerically analyzed for the first time, With the rupture time being successfully calculated, it has been possible to develop a more complete rupture theory for thin liquid films. In contrast to the linear analysis indicating the shortest rupture time of thin liquid films to be the same for both two- and three-dimensional rupture, the nonlinear analysis reveals that the latter proceeds faster than the former. In particular, among all three-dimensional disturbance modes, the symmetric one makes the thin liquid films rupture fastest. It is concluded that the rupture process develops at a point rather than along a line on thin liquid films.

原文English
頁(從 - 到)250-252
頁數3
期刊Journal of Colloid And Interface Science
190
發行號1
DOIs
出版狀態Published - 1997 6月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 生物材料
  • 表面、塗料和薄膜
  • 膠體和表面化學

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