A PDMS/metal-film photo-mask for large-area contact photolithograpy at sub-micrometr scale

Y. C. Lee, Y. T. Hsieh

研究成果: Conference contribution

指紋

深入研究「A PDMS/metal-film photo-mask for large-area contact photolithograpy at sub-micrometr scale」主題。共同形成了獨特的指紋。

Engineering & Materials Science