A silicon oxide hard coating deposited on flexible substrate by TMS - PECVD system

Day Shan Liu, Yu Ko Liao, Cheng Yang Wu, Fuh Shyang Juang, Ching Ting Lee

研究成果: Conference contribution

2 引文 斯高帕斯(Scopus)

摘要

A hard coating silicon oxide film was deposited on flexible substrates by a PECVD system. Tertramethylsilane (TMS) and oxygen were employed as raw materials. Surface roughness and hardness of these films deposited under various TMS/O2 gas flow ratio, rf power and chamber pressure were investigated. At adequate fabricated conditions, the original surface roughness of PMMA (∼ 3.36 nm) and PC (∼ 1.38 nm) substrates was markedly flatted to 1.52 and 0.39 nm, respectively. Meanwhile, the surface hardness of coated PMMA and PC substrates was also enhanced to 6.077 GPa and 3.978 GPa, respectively. The hardness of silicon oxide film deposited by TMS-PECVD system was superior to silicon oxide films prepared from e-beam evaporation and dipping technologies.

原文English
主出版物標題Progress on Advanced Manufacture for Micro/Nano Technology 2005 - Proceedings of the 2005 International Conference on Advanced Manufacture
發行者Trans Tech Publications Ltd
頁面439-444
頁數6
版本PART 1
ISBN(列印)0878499903, 9780878499908
DOIs
出版狀態Published - 2006 一月 1
事件2005 International Conference on Advanced Manufacture, ICAM2005 - Taipei, R.O.C., Taiwan
持續時間: 2005 十一月 282005 十二月 2

出版系列

名字Materials Science Forum
號碼PART 1
505-507
ISSN(列印)0255-5476
ISSN(電子)1662-9752

Other

Other2005 International Conference on Advanced Manufacture, ICAM2005
國家/地區Taiwan
城市Taipei, R.O.C.
期間05-11-2805-12-02

All Science Journal Classification (ASJC) codes

  • 材料科學(全部)
  • 凝聚態物理學
  • 材料力學
  • 機械工業

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