TY - JOUR
T1 - A study of Love wave devices in ZnO/Quartz and ZnO/LiTaO3 structures
AU - Chang, Ren Chuan
AU - Chu, Sheng Yuan
AU - Hong, Cheng Shong
AU - Chuang, Yu Ting
N1 - Funding Information:
This research was supported by the National Science Council of Republic of China, under Grant NSC-93-2216-E-006-033. And the authors also gratefully acknowledge the supports from Center for Micro-Nanotechnology, National Cheng Kung University.
PY - 2006/3/1
Y1 - 2006/3/1
N2 - Love wave devices are very promising for sensing applications because of high sensitivity. In this paper, ZnO thin films doped with lithium (Li) and magnesium (Mg) were deposited on the 42°45′ ST-cut quartz and 36° YX-LiTaO3 substrates by RF magnetron sputtering technique. XRD, SEM, and AFM measurements investigated characteristics of the films. Under different conditions such as doping content, layer thickness, and substrate temperature, the phase velocity, temperature coefficient of frequency, electromechanical coupling coefficient and sensitivity of Love wave devices in ZnO/Quartz and ZnO/LiTaO3 structures are presented. The maximum sensitivities of ZnO/Quartz and ZnO/LiTaO3 are much higher than the SiO 2/Quartz and SiO2/LiTaO3 structures reported.
AB - Love wave devices are very promising for sensing applications because of high sensitivity. In this paper, ZnO thin films doped with lithium (Li) and magnesium (Mg) were deposited on the 42°45′ ST-cut quartz and 36° YX-LiTaO3 substrates by RF magnetron sputtering technique. XRD, SEM, and AFM measurements investigated characteristics of the films. Under different conditions such as doping content, layer thickness, and substrate temperature, the phase velocity, temperature coefficient of frequency, electromechanical coupling coefficient and sensitivity of Love wave devices in ZnO/Quartz and ZnO/LiTaO3 structures are presented. The maximum sensitivities of ZnO/Quartz and ZnO/LiTaO3 are much higher than the SiO 2/Quartz and SiO2/LiTaO3 structures reported.
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U2 - 10.1016/j.tsf.2005.07.065
DO - 10.1016/j.tsf.2005.07.065
M3 - Conference article
AN - SCOPUS:30944461193
SN - 0040-6090
VL - 498
SP - 146
EP - 151
JO - Thin Solid Films
JF - Thin Solid Films
IS - 1-2
T2 - Proceedings of the Third Asian Conference on Chemical Vapor Deposition (Third Asian-CVD), Third Asian CVD
Y2 - 12 November 2004 through 14 November 2004
ER -