A theoretical model for Laser Assisted Direct Imprinting (LADI)

Yung-Chun Lee, Ming Hung Chung, Jun Yi Ruan, Fei Bin Hsiao

研究成果: Conference contribution

1 引文 (Scopus)

摘要

This paper presents a comprehensive theoretical modeling for the laser assisted direct imprinting (LADI) process, which utilizes a quartz mold, pulsed laser heating, and contact pressure for direct nano-patterning and nanostructure fabrication on silicon substartes. The purpose of this work is to reveal the underlying mechanism behind LADI and to quantitatively characterize important imprinting parameters which dominate a successful LADI process. The theoretical modeling consists of three elements, the time-history of silicon melting when subjected to pulsed laser heating, the elastodynamic movement of mold's surface under resistance pressure, and the squeezing out of the molten silicon layer under the pressure from the walls. We have accurately determined the governing equations for each physical problems and derive the interaction relationship between them. A numerical scheme is developed to modeling the whole LADI process. The role of each important factor such as laser fiuence, contact pressure, viscosity of molten substance, and mold's feature size can be understood and visualized through this model and their influences on the final imprinting depth are also quantitatively determined.

原文English
主出版物標題Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007
頁面493-496
頁數4
DOIs
出版狀態Published - 2007 八月 28
事件2007 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007 - Bangkok, Thailand
持續時間: 2007 一月 162007 一月 19

出版系列

名字Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007

Other

Other2007 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007
國家Thailand
城市Bangkok
期間07-01-1607-01-19

指紋

Lasers
Laser heating
Pulsed lasers
Silicon
Molten materials
Contacts (fluid mechanics)
Quartz
Nanostructures
Melting
Viscosity
Fabrication

All Science Journal Classification (ASJC) codes

  • Computer Networks and Communications
  • Computer Science Applications
  • Electrical and Electronic Engineering

引用此文

Lee, Y-C., Chung, M. H., Ruan, J. Y., & Hsiao, F. B. (2007). A theoretical model for Laser Assisted Direct Imprinting (LADI). 於 Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007 (頁 493-496). [4160368] (Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007). https://doi.org/10.1109/NEMS.2007.352065
Lee, Yung-Chun ; Chung, Ming Hung ; Ruan, Jun Yi ; Hsiao, Fei Bin. / A theoretical model for Laser Assisted Direct Imprinting (LADI). Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007. 2007. 頁 493-496 (Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007).
@inproceedings{4a2df908b2144bf7b93b70e03076b6c7,
title = "A theoretical model for Laser Assisted Direct Imprinting (LADI)",
abstract = "This paper presents a comprehensive theoretical modeling for the laser assisted direct imprinting (LADI) process, which utilizes a quartz mold, pulsed laser heating, and contact pressure for direct nano-patterning and nanostructure fabrication on silicon substartes. The purpose of this work is to reveal the underlying mechanism behind LADI and to quantitatively characterize important imprinting parameters which dominate a successful LADI process. The theoretical modeling consists of three elements, the time-history of silicon melting when subjected to pulsed laser heating, the elastodynamic movement of mold's surface under resistance pressure, and the squeezing out of the molten silicon layer under the pressure from the walls. We have accurately determined the governing equations for each physical problems and derive the interaction relationship between them. A numerical scheme is developed to modeling the whole LADI process. The role of each important factor such as laser fiuence, contact pressure, viscosity of molten substance, and mold's feature size can be understood and visualized through this model and their influences on the final imprinting depth are also quantitatively determined.",
author = "Yung-Chun Lee and Chung, {Ming Hung} and Ruan, {Jun Yi} and Hsiao, {Fei Bin}",
year = "2007",
month = "8",
day = "28",
doi = "10.1109/NEMS.2007.352065",
language = "English",
isbn = "1424406102",
series = "Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007",
pages = "493--496",
booktitle = "Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007",

}

Lee, Y-C, Chung, MH, Ruan, JY & Hsiao, FB 2007, A theoretical model for Laser Assisted Direct Imprinting (LADI). 於 Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007., 4160368, Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007, 頁 493-496, 2007 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007, Bangkok, Thailand, 07-01-16. https://doi.org/10.1109/NEMS.2007.352065

A theoretical model for Laser Assisted Direct Imprinting (LADI). / Lee, Yung-Chun; Chung, Ming Hung; Ruan, Jun Yi; Hsiao, Fei Bin.

Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007. 2007. p. 493-496 4160368 (Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007).

研究成果: Conference contribution

TY - GEN

T1 - A theoretical model for Laser Assisted Direct Imprinting (LADI)

AU - Lee, Yung-Chun

AU - Chung, Ming Hung

AU - Ruan, Jun Yi

AU - Hsiao, Fei Bin

PY - 2007/8/28

Y1 - 2007/8/28

N2 - This paper presents a comprehensive theoretical modeling for the laser assisted direct imprinting (LADI) process, which utilizes a quartz mold, pulsed laser heating, and contact pressure for direct nano-patterning and nanostructure fabrication on silicon substartes. The purpose of this work is to reveal the underlying mechanism behind LADI and to quantitatively characterize important imprinting parameters which dominate a successful LADI process. The theoretical modeling consists of three elements, the time-history of silicon melting when subjected to pulsed laser heating, the elastodynamic movement of mold's surface under resistance pressure, and the squeezing out of the molten silicon layer under the pressure from the walls. We have accurately determined the governing equations for each physical problems and derive the interaction relationship between them. A numerical scheme is developed to modeling the whole LADI process. The role of each important factor such as laser fiuence, contact pressure, viscosity of molten substance, and mold's feature size can be understood and visualized through this model and their influences on the final imprinting depth are also quantitatively determined.

AB - This paper presents a comprehensive theoretical modeling for the laser assisted direct imprinting (LADI) process, which utilizes a quartz mold, pulsed laser heating, and contact pressure for direct nano-patterning and nanostructure fabrication on silicon substartes. The purpose of this work is to reveal the underlying mechanism behind LADI and to quantitatively characterize important imprinting parameters which dominate a successful LADI process. The theoretical modeling consists of three elements, the time-history of silicon melting when subjected to pulsed laser heating, the elastodynamic movement of mold's surface under resistance pressure, and the squeezing out of the molten silicon layer under the pressure from the walls. We have accurately determined the governing equations for each physical problems and derive the interaction relationship between them. A numerical scheme is developed to modeling the whole LADI process. The role of each important factor such as laser fiuence, contact pressure, viscosity of molten substance, and mold's feature size can be understood and visualized through this model and their influences on the final imprinting depth are also quantitatively determined.

UR - http://www.scopus.com/inward/record.url?scp=34548120204&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34548120204&partnerID=8YFLogxK

U2 - 10.1109/NEMS.2007.352065

DO - 10.1109/NEMS.2007.352065

M3 - Conference contribution

AN - SCOPUS:34548120204

SN - 1424406102

SN - 9781424406104

T3 - Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007

SP - 493

EP - 496

BT - Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007

ER -

Lee Y-C, Chung MH, Ruan JY, Hsiao FB. A theoretical model for Laser Assisted Direct Imprinting (LADI). 於 Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007. 2007. p. 493-496. 4160368. (Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007). https://doi.org/10.1109/NEMS.2007.352065