摘要
We demonstrate a new GaAs regenerative switching device with a double triangular barrier (DTB) structure, i.e., p+-i- δ(n+)-i- δ(p+)-i-n+, prepared by molecular beam epitaxy (MBE). Using the concept of sequential collapse of the internal barriers, two distinctive switching regions are established. First, a negative resistance region (S-type) is observed, followed by a positive resistance region (inverted N-shape) in between the switching behavior with the increase of applied bias. This device may have applicability for tristate logic circuits.
| 原文 | English |
|---|---|
| 頁(從 - 到) | L243-L246 |
| 期刊 | Japanese journal of applied physics |
| 卷 | 29 |
| 發行號 | 2 |
| DOIs | |
| 出版狀態 | Published - 1990 2月 |
All Science Journal Classification (ASJC) codes
- 一般工程
- 一般物理與天文學
指紋
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