Absence of fermi-level pinning at cleaved nonpolar InN surfaces

Chung Lin Wu, Hong Mao Lee, Cheng Tai Kuo, Chia Hao Chen, Shangjr Gwo

研究成果: Article

89 引文 (Scopus)

摘要

Prior experimental work had found that the Fermi level at InN growth surfaces is pinned well above the conduction band edge, leading to strong surface band bending and electron accumulation. Using cross-sectional scanning photoelectron microscopy and spectroscopy, we show definitive evidence of unpinned Fermi level for in situ cleaved a-plane InN surfaces. To confirm the presence or absence of band bending, the surface Fermi level relative to the valence band edge was precisely measured by using both the Fermi edge of Au reference sample and the core level of ultrathin Au overlayer. It is confirmed that flat surface bands only occur at cleaved nonpolar surfaces, consistent with the recent theoretical predictions.

原文English
文章編號106803
期刊Physical review letters
101
發行號10
DOIs
出版狀態Published - 2008 九月 4

指紋

leading edges
Fermi surfaces
flat surfaces
conduction bands
photoelectrons
microscopy
valence
scanning
predictions
spectroscopy
electrons

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

引用此文

Wu, Chung Lin ; Lee, Hong Mao ; Kuo, Cheng Tai ; Chen, Chia Hao ; Gwo, Shangjr. / Absence of fermi-level pinning at cleaved nonpolar InN surfaces. 於: Physical review letters. 2008 ; 卷 101, 編號 10.
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Absence of fermi-level pinning at cleaved nonpolar InN surfaces. / Wu, Chung Lin; Lee, Hong Mao; Kuo, Cheng Tai; Chen, Chia Hao; Gwo, Shangjr.

於: Physical review letters, 卷 101, 編號 10, 106803, 04.09.2008.

研究成果: Article

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