Acceptor states in boron doped SiGe quantum wells

K. Schmalz, M. S. Kagan, I. V. Altukhov, K. A. Korolev, D. V. Orlov, V. P. Sinis, S. G. Tomas, K. L. Wang, I. N. Yassievich

研究成果: Article同行評審


The temperature dependences of lateral conductivity and hole mobility in SiGe quantum well structures selectively doped with boron are presented. The boron A+ centers are found to exist and determine the low-temperature conductivity. The activation energy of conductivity at higher temperatures is shown to be determined by the energy distance between strain-split boron A0 centers. The model of two-stage excitation of free holes including the thermal activation of holes from the ground to split-off state and next tunneling into the valence band is proposed. The binding energy of A+ centers and the energy splitting of boron ground states by strain are found.

頁(從 - 到)91-96
期刊Materials Science Forum
發行號PART 1
出版狀態Published - 1997

All Science Journal Classification (ASJC) codes

  • 一般材料科學
  • 凝聚態物理學
  • 材料力學
  • 機械工業


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