摘要
The temperature dependences of lateral conductivity and hole mobility in SiGe quantum well structures selectively doped with boron are presented. The boron A+ centers are found to exist and determine the low-temperature conductivity. The activation energy of conductivity at higher temperatures is shown to be determined by the energy distance between strain-split boron A0 centers. The model of two-stage excitation of free holes including the thermal activation of holes from the ground to split-off state and next tunneling into the valence band is proposed. The binding energy of A+ centers and the energy splitting of boron ground states by strain are found.
原文 | English |
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頁(從 - 到) | 1613-1618 |
頁數 | 6 |
期刊 | Materials Science Forum |
卷 | 258-263 |
發行號 | 9993 |
DOIs | |
出版狀態 | Published - 1997 |
All Science Journal Classification (ASJC) codes
- 材料科學(全部)
- 凝聚態物理學
- 材料力學
- 機械工業