Acidic acrylic polymers for nanoimprint lithography on flexible substrates

Wen Chang Liao, Steve Lien Chung Hsu

研究成果: Article同行評審

3 引文 斯高帕斯(Scopus)

摘要

A series of environmental friendly acidic resists were prepared for nanoimprint lithography on flexible plastic substrates. These resists can be easily removed by an aqueous base solution at the final stripping step instead of using an organic solvent or reactive ion etching (RIE), which is used in conventional imprint processes. The resist polymers were prepared via free radical copolymerization of methylmethacrylate (MMA), n -butylacrylate (n -BA) and methacrylic acid (MAA) monomers. For use on flexible plastic substrates, the glass transition temperatures of these polymers were adjusted to a range of 25-41 °C according to the molar ratio of the monomers. The weight average molecular weights (Mw) of these polymers were between 30 000 and 40 000 gmole measured by GPC. Replications of high-density line and space patterns with resolution of 5 μm and 100 nm were obtained on a flexible indium tin oxide/poly(ethylene terephthalate) (ITO/PET) substrate. The subsequent ITO etching pattern was also achieved.

原文English
頁(從 - 到)2518-2521
頁數4
期刊Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
23
發行號6
DOIs
出版狀態Published - 2005 十一月

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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