| 原文 | English |
|---|---|
| 主出版物標題 | 2019 IEEE 15th International Conference on Automation Science and Engineering (CASE) |
| 出版地 | Vancouver, BC, Canada |
| 出版狀態 | Published - 2019 |
引用此文
Lee, C-Y., & Wu, C. M. (2019). Adaptive Genetic Algorithm for Lithography Scheduling in Semiconductor DRAM Fab. 於 2019 IEEE 15th International Conference on Automation Science and Engineering (CASE) Vancouver, BC, Canada.
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title = "Adaptive Genetic Algorithm for Lithography Scheduling in Semiconductor DRAM Fab.",
author = "Chia-Yen Lee and Wu, {C. M.}",
year = "2019",
language = "English",
booktitle = "2019 IEEE 15th International Conference on Automation Science and Engineering (CASE)",
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Lee, C-Y & Wu, CM 2019, Adaptive Genetic Algorithm for Lithography Scheduling in Semiconductor DRAM Fab. 於 2019 IEEE 15th International Conference on Automation Science and Engineering (CASE). Vancouver, BC, Canada.
Adaptive Genetic Algorithm for Lithography Scheduling in Semiconductor DRAM Fab. / Lee, Chia-Yen; Wu, C. M.
2019 IEEE 15th International Conference on Automation Science and Engineering (CASE). Vancouver, BC, Canada, 2019.研究成果: Conference contribution
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AU - Lee, Chia-Yen
AU - Wu, C. M.
PY - 2019
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M3 - Conference contribution
BT - 2019 IEEE 15th International Conference on Automation Science and Engineering (CASE)
CY - Vancouver, BC, Canada
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Lee C-Y, Wu CM. Adaptive Genetic Algorithm for Lithography Scheduling in Semiconductor DRAM Fab. 於 2019 IEEE 15th International Conference on Automation Science and Engineering (CASE). Vancouver, BC, Canada. 2019