ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

貢獻的翻譯標題: 應用具信心指標之虛擬量測的先進製程控制機制

Fan-Tien Cheng (Inventor)

研究成果: Patent

摘要

An advanced process control (APC) system, an APC method, and a computer program product, which, when executed, performs an APC method are provided for incorporating virtual metrology (VM) into APC. The present inventions uses a reliance index (RI) and a global similarity index (GSI) to adjust at least one controller gain of a run-to-run (R2R) controller when the VM value of a workpiece is adopted to replace the actual measurement value of the workpiece. The RI is used for gauging the reliability of the VM value,
貢獻的翻譯標題應用具信心指標之虛擬量測的先進製程控制機制
原文English
專利號8688256
出版狀態Published - 2012 二月 2

指紋 深入研究「應用具信心指標之虛擬量測的先進製程控制機制」主題。共同形成了獨特的指紋。

引用此